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Pre-owned systems
Z 550 sputtering system with high chamber ( Sputtering system for R&D )
Features
Sputter-down system with 4-5 cathodes PK 150 ( 150mm dia. ), cathodes with dia. =75mm or dia. =100mm are although possible by using adaption flanges.
3 cathodes PK 200 (200mm dia.) although possible or 2 cathodes PK 150 and 2 cathodes PK 200, both on opposite sides (180°).
Sputter-etching
Optional: Semi-automatic, single-substrate load-lock or fully automatic magazine load-lock avail- able.
Sputter mode RF/DC, with or without RF-Bias.
Presputter-shutter available in different shapes.
PLC-controlled. 40 recipes collected from 120 layers can be stored.
9"-terminal for visualization.
Pumping system has to be equipped according to your wishes.
Optional, machine can be retrofitted using Simatic-S7 PLC, PC for process values and datalogging and 19"-TFT-monitor for visualization.
please ask for more details
System Dimensions, Weight
Pictures Z550 with high chamber
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A 550 VZK refurbished Z 400 upgraded Z 550 upgraded Z 550 upgraded Target